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On an Experimental Study of the Electron Generation Property of Thin Gold Films

Mehran Vagheian, Shahyar Saramad, Dariush Rezaie Ochbelagh1 and Dariush Sardari

In the present study, the effects of the thickness and deposition rate at different X-ray energies on the electron generation property of thin gold films have been investigated. In order to find out the effects of different thickness, thin gold films with the thickness of 10, 100 and 1000 nanometres at two different deposition rates namely 1 angstrom/s and 1 nm/s have been considered. All the prepared samples have been fabricated using the Physical Vapour Deposition technique (PVD) and characterized by the Energy Dispersive Spectroscopy (EDS), Scanning Electron Microscopy (SEM) and X-Ray Diffraction Technique (XRD). The results all clearly indicate that the yield of electron generation for the deposition rate of 1 angstrom/s is much higher than that those of 1 nm/s. Moreover, the obtained results reveal the superior electron generation property of 100 nm thickness in comparison to the other considered thicknesses.